Editor-in-Chief

Renato Perez Ribas

Universidade Federal do Rio Grande do Sul

Porto Alegre, Brazil

Co-Editor

Gilson Inacio Wirth

Universidade Federal do Rio Grande do Sul

Porto Alegre, Brazil

Associate Editors:

Process and Materials

Jacobus Swart, State University of Campinas, Brazil

Magali Estrada, CINVESTAV, Mexico

Olivier Bonnaud, University of Rennes, France

Devices and Characterization

Cor Claeys, IMEC, Belgium

João Antonio Martino, USP, Brazil

IC Design

Elmar Uwe Kurt Melcher, Federal University of Campina Grande, Brazil

Jürgen Becker, Karlsruhe Institute of Technology, Germany

Guido Araújo, State University of Campinas, Brazil

Test

Alex Orailoglu, UCSD, USA

Michel Renovell, LIRMM, France